當(dāng)前位置：首頁 SCI期刊 SCIE期刊物理與天體物理中科院3區(qū) JCRQ2 期刊介紹(非官網(wǎng))

Plasma Chemistry And Plasma ProcessingSCIE

國際簡稱：PLASMA CHEM PLASMA P 參考譯名：等離子化學(xué)和等離子處理

中科院分區(qū)
3區(qū)
CiteScore分區(qū)
Q1
JCR分區(qū)
Q2

基本信息：: ISSN：0272-4324; E-ISSN：1572-8986; 是否OA：未開放; 是否預(yù)警：否; TOP期刊：否

出版信息：: 出版地區(qū)：UNITED STATES; 出版商：Springer US; 出版語言：English; 出版周期：Quarterly; 出版年份：1981; 研究方向：工程技術(shù)-工程：化工

評價信息：: 影響因子：2.6; H-index：57; CiteScore指數(shù)：5.9; SJR指數(shù)：0.48; SNIP指數(shù)：0.912

發(fā)文數(shù)據(jù)：: Gold OA文章占比：14.18%; 研究類文章占比：95.12%; 年發(fā)文量：123; 自引率：0.0833...; 開源占比：0.0935; 出版撤稿占比：0; 出版國人文章占比：0.18; OA被引用占比：0.0820...

投稿咨詢加急見刊

英文簡介期刊介紹 CiteScore數(shù)據(jù) 中科院SCI分區(qū) JCR分區(qū) 發(fā)文數(shù)據(jù) 常見問題

英文簡介Plasma Chemistry And Plasma Processing期刊介紹

Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.

期刊簡介Plasma Chemistry And Plasma Processing期刊介紹

《Plasma Chemistry And Plasma Processing》自1981出版以來，是一本物理與天體物理優(yōu)秀雜志。致力于發(fā)表原創(chuàng)科學(xué)研究結(jié)果，并為物理與天體物理各個領(lǐng)域的原創(chuàng)研究提供一個展示平臺，以促進(jìn)物理與天體物理領(lǐng)域的的進(jìn)步。該刊鼓勵先進(jìn)的、清晰的闡述，從廣泛的視角提供當(dāng)前感興趣的研究主題的新見解，或?qū)彶槎嗄陙砟硞€重要領(lǐng)域的所有重要發(fā)展。該期刊特色在于及時報道物理與天體物理領(lǐng)域的最新進(jìn)展和新發(fā)現(xiàn)新突破等。該刊近一年未被列入預(yù)警期刊名單，目前已被權(quán)威數(shù)據(jù)庫SCIE收錄，得到了廣泛的認(rèn)可。

該期刊投稿重要關(guān)注點：

預(yù)計審稿時間：較慢,6-12周
物理與天體物理
ENGINEERING, CHEMICAL
SCIE
中科院3區(qū)
非預(yù)警

Cite Score數(shù)據(jù)（2024年最新版）Plasma Chemistry And Plasma Processing Cite Score數(shù)據(jù)

CiteScore：5.9
SJR：0.48
SNIP：0.912

學(xué)科類別	分區(qū)	排名	百分位
大類：Physics and Astronomy 小類：Condensed Matter Physics	Q1	108 / 434	75%
大類：Physics and Astronomy 小類：Surfaces, Coatings and Films	Q2	34 / 132	74%
大類：Physics and Astronomy 小類：General Chemical Engineering	Q2	79 / 273	71%
大類：Physics and Astronomy 小類：General Chemistry	Q2	119 / 408	70%

CiteScore 是由Elsevier(愛思唯爾)推出的另一種評價期刊影響力的文獻(xiàn)計量指標(biāo)。反映出一家期刊近期發(fā)表論文的年篇均引用次數(shù)。CiteScore以Scopus數(shù)據(jù)庫中收集的引文為基礎(chǔ)，針對的是前四年發(fā)表的論文的引文。CiteScore的意義在于，它可以為學(xué)術(shù)界提供一種新的、更全面、更客觀地評價期刊影響力的方法，而不僅僅是通過影響因子(IF)這一單一指標(biāo)來評價。

歷年Cite Score趨勢圖

中科院SCI分區(qū)Plasma Chemistry And Plasma Processing 中科院分區(qū)

中科院 2023年12月升級版 綜述期刊：否 Top期刊：否

大類學(xué)科	分區(qū)	小類學(xué)科	分區(qū)
物理與天體物理	3區(qū)	ENGINEERING, CHEMICAL 工程：化工 PHYSICS, APPLIED 物理：應(yīng)用 PHYSICS, FLUIDS & PLASMAS 物理：流體與等離子體	3區(qū) 3區(qū) 3區(qū)

中科院分區(qū)表 是以客觀數(shù)據(jù)為基礎(chǔ)，運用科學(xué)計量學(xué)方法對國際、國內(nèi)學(xué)術(shù)期刊依據(jù)影響力進(jìn)行等級劃分的期刊評價標(biāo)準(zhǔn)。它為我國科研、教育機構(gòu)的管理人員、科研工作者提供了一份評價國際學(xué)術(shù)期刊影響力的參考數(shù)據(jù)，得到了全國各地高校、科研機構(gòu)的廣泛認(rèn)可。

中科院分區(qū)表 將所有期刊按照一定指標(biāo)劃分為1區(qū)、2區(qū)、3區(qū)、4區(qū)四個層次，類似于“優(yōu)、良、及格”等。最開始，這個分區(qū)只是為了方便圖書管理及圖書情報領(lǐng)域的研究和期刊評估。之后中科院分區(qū)逐步發(fā)展成為了一種評價學(xué)術(shù)期刊質(zhì)量的重要工具。

歷年中科院分區(qū)趨勢圖

JCR分區(qū)Plasma Chemistry And Plasma Processing JCR分區(qū)

2023-2024 年最新版

按JIF指標(biāo)學(xué)科分區(qū)	收錄子集	分區(qū)	排名	百分位
學(xué)科：ENGINEERING, CHEMICAL	SCIE	Q3	91 / 170	46.8%
學(xué)科：PHYSICS, APPLIED	SCIE	Q2	81 / 179	55%
學(xué)科：PHYSICS, FLUIDS & PLASMAS	SCIE	Q2	12 / 40	71.3%

按JCI指標(biāo)學(xué)科分區(qū)	收錄子集	分區(qū)	排名	百分位
學(xué)科：ENGINEERING, CHEMICAL	SCIE	Q2	55 / 171	68.13%
學(xué)科：PHYSICS, APPLIED	SCIE	Q2	69 / 179	61.73%
學(xué)科：PHYSICS, FLUIDS & PLASMAS	SCIE	Q2	17 / 40	58.75%

JCR分區(qū)的優(yōu)勢在于它可以幫助讀者對學(xué)術(shù)文獻(xiàn)質(zhì)量進(jìn)行評估。不同學(xué)科的文章引用量可能存在較大的差異，此時單獨依靠影響因子(IF)評價期刊的質(zhì)量可能是存在一定問題的。因此，JCR將期刊按照學(xué)科門類和影響因子分為不同的分區(qū)，這樣讀者可以根據(jù)自己的研究領(lǐng)域和需求選擇合適的期刊。

歷年影響因子趨勢圖

發(fā)文數(shù)據(jù)

2023-2024 年國家/地區(qū)發(fā)文量統(tǒng)計

國家/地區(qū)數(shù)量
CHINA MAINLAND70
Russia37
USA29
France26
GERMANY (FED REP GER)21
Czech Republic15
Iran14
India12
Japan12
Poland11

本刊中國學(xué)者近年發(fā)表論文

1、Plasma-Catalytic Ammonia Decomposition for Carbon-Free Hydrogen Production Using Low Pressure-Synthesized Mo2N Catalyst
Author: Yu, Xiuxia; Hu, Ke; Zhang, Huazhou; He, Ge; Xia, Yuanhua; Deng, Mao; Shi, Yang; Yang, Chi; Mao, Xinchun; Wang, Zhijun

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 183-197. DOI: 10.1007/s11090-022-10282-y
2、Electron Density and Electron Temperature Control with a Magnetic Field and a Grid in Inductively Coupled Argon Plasma
Author: He, Yun-peng; Jin, Wei; Wang, Yi-bo; Lv, Shao-bo; Wang, Rui-sheng; Liu, Jun-qi; Liu, Hai-cheng

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 381-400. DOI: 10.1007/s11090-022-10295-7
3、Study on the Anticancer Effects of Plasma-Activated Saline Perfusion Based on a Microfluidic System
Author: Zhang, Jishen; Xu, Shengduo; Jing, Xixi; Liu, Dingxin; Zhang, Hao; Wang, Zifeng; Xu, Dehui; Zhang, Geng; Yang, Xiaojian; Wang, Xiaohua; Kong, Michael G.; Rong, Mingzhe

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 99-110. DOI: 10.1007/s11090-022-10297-5
4、A RF plasma source with focused magnetic field for material treatment
Author: Zhang, L. P.; Chang, L.; Yuan, X. G.; Zhang, J. H.; Zhou, H. S.; Luo, G. N.

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 329-345. DOI: 10.1007/s11090-022-10300-z
5、Influence Mechanism of O-2/H2O Adsorption on Cu(111) Surface on SF6 Overheating Failure Decomposition
Author: Zeng, Fuping; Kexin Zhu; Su, Dazhi; Feng, Xiaoxuan; Guo, Xinnuo; Yao, Qiang; Tang, Ju

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 67-80. DOI: 10.1007/s11090-022-10305-8
6、Synergistic 2,4-D Degradation by Fenton Reagent Obtained from Glow Discharge Plasma Formed H2O2 and DBD Pretreated Fe-Rich Sludge Catalyst
Author: Huang, Shaoyong; Huang, Quanjia; Gan, Jiaming; Li, Ting; Wang, Lei

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 2, pp. 491-511. DOI: 10.1007/s11090-022-10306-7
7、Hydrodeoxygenation of o-Cresol Over Mo2C Modified by O-2 Plasma
Author: Yu, Zihan; Yu, Zhiquan; Wang, Yao; Liu, Yingya; Wang, Anjie

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 2, pp. 533-545. DOI: 10.1007/s11090-022-10310-x
8、Theoretical Study on the Degradation Pathways of Unsymmetrical Dimethylhydrazine by Aqueous O-3
Author: Luo, Santu; Fu, Yuwei; Zhang, Mingyan; Liu, Yifan; Wang, Diankai; Zhang, Jiawei; Liu, Dingxin; Rong, Mingzhe

Journal: PLASMA CHEMISTRY AND PLASMA PROCESSING. 2023; Vol. 43, Issue 1, pp. 81-97. DOI: 10.1007/s11090-022-10307-6